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@prvn-pa
Last active April 12, 2023 10:30
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Substrate etching and cleaning procedure

Substrate Cleaning Procedure

// {type:state}
// {generate:true}

(start)[Step 1]->(Treat in Piranha solution for 3 sec)
(Treat in Piranha solution for 3 sec)[Step 2]->(Rinse in DD water for 10 sec)
(Rinse in DD water for 10 sec)[Step 3]->(Air Blow)
(Air Blow)[Step 4]->(Hot air blow)
(Hot air blow)[Step 5]->(Rinse in Acetone)
(Rinse in Acetone)[Step 6]->(Air Blow)
(Air Blow)[Step 7]->(Rinse in Acetone)
(Rinse in Acetone)[Step 8]->(Air Blow)
(Air Blow)[Step 9]->(Rinse in IPA)
(Rinse in IPA)[Step 10]->(Air Blow)
(Air Blow)[Step 11]->(Hot air blow)
(Hot air blow)[Step 12]->(Heat treatment for 10 mins at 100 deg)->(end)
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